ETCMOS 2017 Vol. 6: Advanced Materials and Optoelectronics Track: Presentation SlidesETCMOS Services, Inc. ETCMOS Services Inc., May 30, 2017 - 150 pages Presentation slides from the 2017 ETCMOS Emerging Technologies conference, May 28 - 30, 2017, in Warsaw, Poland |
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Absorbers AMLEDs Analysis Appl approach Back bonds Carrier Carrier Reservoirs Characterization and Figure CMOS coating Conditions conference cost coupling CURRENT Demonstrated Density designs Develop Devices dielectrics difference diffusion DIODES driver Dutta dynamics effect efficiency Electrical Electron Emission emitter Energy Equation Etch external Fabricated field Figure of Merit filter forcefields Front Function Gb/s grating high-K Hydrogen Hydrogen diffusion IEEE imaging Infrared Institute Integration Interaction interface laser layer light limits lines lithography Materials Matrix Measured MEMBRANES MEMS Metal Microelectronic mirror Model modulation Motivation NiSi Optical Filters Outline Oxide Passivated performance Peter Bermel 29 Photon Phys Poland present Process Prof radiation Rate Research resistance resonance response Results Selective Selective Solar silicon silver simulations SiO2 Solar Cells Source spectral tapers Technology Temperature Thermal Transfer Tunnel Contacts University Visible Volume wafer Warsaw Wavelength